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ocds-b5fd17-c2282e97-5c3a-4d19-90c0-1fe82ba6b29ePublished facts
6a5458b9-7ef6-49e4-9dbe-c720d599dc0d-674848NOTICE OF AWARD OF four dry etch and deposition systems, specifically: •A Deep-Silicon Reactive Ion Etcher (D-RIE) •An Inductively Coupled Plasma-RIE (ICP-RIE) •A parallel plate RIE •A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD)
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6a5458b9-7ef6-49e4-9dbe-c720d599dc0d-674848Awards and suppliers
Buyer: UNIVERSITY OF LEEDSSupplier: Oxford Instruments
ocds-b5fd17-c2282e97-5c3a-4d19-90c0-1fe82ba6b29e-1End dates, recurrence wording and links are shown as they appear in public notices. They do not create a new opportunity. If no later linked record appears here, that means Bidwake did not find one in the records it has loaded; it does not prove that none exists.